Consistent behavior of certain perturbed determinants induced by graphsEJOV, Vladimir; NGUYEN, Giang T.Linear algebra and its applications. 2009, Vol 431, Num 5-7, pp 543-552, issn 0024-3795, 10 p.Article

Inhibitors of TACE and caspase-1 as anti-inflammatory drugsLE, Giang T; ABBENANTE, Giovanni.Current medicinal chemistry. 2005, Vol 12, Num 25, pp 2963-2977, issn 0929-8673, 15 p.Article

A note on the graph's resolvent and the multifilar structureEJOV, Vladimir; FRIEDLAND, Shmuel; NGUYEN, Giang T et al.Linear algebra and its applications. 2009, Vol 431, Num 8, pp 1367-1379, issn 0024-3795, 13 p.Article

Mycophenolate mofetil treatment accelerates recovery from experimental allergic encephalomyelitisTRAN, Giang T; CARTER, Nicole; HODGKINSON, Suzanne J et al.International immunopharmacology. 2001, Vol 1, Num 9-10, pp 1709-1723, issn 1567-5769Article

20th annual BACUS symposium on photomask technology (Monterey CA, 13-15 September 2000)Grenon, Brian J; Dao, Giang T.SPIE proceedings series. 2001, isbn 0-8194-3849-9, XV, 938 p, isbn 0-8194-3849-9Conference Proceedings

Ejection force modeling for stereolithography injection molding toolsPHAM, Giang T; COLTON, Jonathan S.Polymer engineering and science. 2002, Vol 42, Num 4, pp 681-693, issn 0032-3888Article

Is it time to change mask magnification?SHELDEN, Gil.SPIE proceedings series. 2001, pp 762-766, isbn 0-8194-3849-9Conference Paper

A Behavioral Analysis of the Role of CA3 and CA1 Subcortical Efferents During Classical Fear ConditioningHUNSAKER, Michael R; TRAN, Giang T; KESNER, Raymond P et al.Behavioral neuroscience. 2009, Vol 123, Num 3, pp 624-630, issn 0735-7044, 7 p.Article

DETERMINANTS AND LONGEST CYCLES OF GRAPHSEJOV, Vladimir; FILAR, Jerzy A; MURRAY, Walter et al.SIAM journal on discrete mathematics (Print). 2009, Vol 22, Num 3, pp 1215-1225, issn 0895-4801, 11 p.Article

The Neolithography consortium : a progress reportPOTZICK, James.SPIE proceedings series. 2001, pp 674-680, isbn 0-8194-3849-9Conference Paper

Investigation of proximity effects in alternating aperture phase shifting masksPIERRAT, C.SPIE proceedings series. 2001, pp 325-335, isbn 0-8194-3849-9Conference Paper

Fabricating 0.10-μm line patterns using attenuated phase shift masksIWASAKI, Haruo.SPIE proceedings series. 2001, pp 336-345, isbn 0-8194-3849-9Conference Paper

A refined agonist pharmacophore for protease activated receptor 2BARRY, Grant D; SUEN, Jacky Y; LOW, Heng Boon et al.Bioorganic & medicinal chemistry letters (Print). 2007, Vol 17, Num 20, pp 5552-5557, issn 0960-894X, 6 p.Article

Cancer and Communication in the Health Care Setting : Experiences of Older Vietnamese Immigrants, A Qualitative StudyNGUYEN, Giang T; BARG, Frances K; ARMSTRONG, Katrina et al.Journal of general internal medicine. 2008, Vol 23, Num 1, pp 45-50, issn 0884-8734, 6 p.Article

157-nm photomask handling and infrastructure : Requirements and feasibilityCULLINS, Jerry; MUZIO, Ed.SPIE proceedings series. 2001, pp 756-761, isbn 0-8194-3849-9Conference Paper

Automated atomic force metrology applications for alternating aperture phase shift masksMILLER, Kirk; TODD, Bradley.SPIE proceedings series. 2001, pp 681-687, isbn 0-8194-3849-9Conference Paper

Minimization of mask transmission asymmetry effect for chromeless phase-shift masksCHAN, David; NOVAK, Justin; FRITZE, Michael et al.SPIE proceedings series. 2001, pp 911-920, isbn 0-8194-3849-9Conference Paper

Practical defect sizing issues for UV inspection of 248nm embedded attenuated PSM contact layerREYNOLDS, James A.SPIE proceedings series. 2001, pp 198-206, isbn 0-8194-3849-9Conference Paper

OPC reticle inspection techniquesAIBUA DONG; REESE, Bryan W.SPIE proceedings series. 2001, pp 620-629, isbn 0-8194-3849-9Conference Paper

Plasma etch of binary Cr masks : CD uniformity study of photomasks utilizing varying Cr loads - Part IIICONSTANTINE, C; WESTERMANN, R; PLUMHOFF, J et al.SPIE proceedings series. 2001, pp 85-96, isbn 0-8194-3849-9Conference Paper

CARs blanks feasibility study results for the advanced EB reticle fabricationHASHIMOTO, Masahiro; KOBAYASHI, Hideo; YOKOYA, Yasunori et al.SPIE proceedings series. 2001, pp 561-577, isbn 0-8194-3849-9Conference Paper

Development of simplified process for KrF excimer half-tone mask with chrome-shielding method (II)KOBAYASHI, Shinji; WATANABE, Kunio; OHMORI, Kiyoshige et al.SPIE proceedings series. 2001, pp 801-809, isbn 0-8194-3849-9Conference Paper

Efficient automated tapeout systemKRIEGER, William A; NASAMRAN, Chana.SPIE proceedings series. 2001, pp 140-147, isbn 0-8194-3849-9Conference Paper

Comprehensive simulation of e-beam lithography processes using PROLITH/3D and TEMPTATION software toolsKUZMIN, I. Yu; MACK, C. A.SPIE proceedings series. 2001, pp 503-507, isbn 0-8194-3849-9Conference Paper

Subtractive defect repair via nanomachiningLAURANCE, Mark R.SPIE proceedings series. 2001, pp 670-673, isbn 0-8194-3849-9Conference Paper